Plasma Measurement of Electron Cyclotron Resonance Ion Source for New Materials Production
نویسندگان
چکیده
منابع مشابه
New Dual-type Electron Cyclotron Resonance Ion Source for a Universal Source of Synthesized Ion Beams*
A new dual-type source has been constructing on the basis of electron cyclotron resonance (ECR) plasma for producing synthesized ion beams in Osaka Univ. Magnetic field in the 1st stage consists of all permanent magnets, i.e., cylindrically comb shaped one, and that of the 2nd stage consists of a pair of mirror coil, a supplemental coil and the octupole magnets. Both stage plasmas can be indivi...
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ژورنال
عنوان ژورنال: Journal of the Vacuum Society of Japan
سال: 2010
ISSN: 1882-4749,1882-2398
DOI: 10.3131/jvsj2.53.169